Carbon X-ray photoelectron spectroscopy A Multilayers Biofilms microbiens Chalcogenide glass B2 Semiconducting alloys B1 Inorganic compounds Cathepsin Optical properties Resistive switching Chromophore A1 Characterization Chemical detection A Chalcogenides Carbon nanotubes Aluminium nitride Mott insulator Chalcogenide Ablation laser Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Adsorption Cluster Compound Band gap Physical vapor deposition Capacitance Structure Band alignment Calcined clay Alzheimer's disease Plasma etching A-CNx Chalcogenides TEM B2 Quaternary Bipolar resistive switching BRS Mott insulators SF 6 Chemical and biological sensors AlN Films Chemical sensors Colloidal solution Etching Transmission electron microscopy Amorphous Amyloid precursor Selenization Magnetron sputtering Plasmas froids Ambipolar material B2 Semiconducting indium compounds Nanocomposite Nanotubes Semiconductors TiO2 CIGSe A3 Physical vapor deposition processes Transfert d'énergie Titanium dioxide Carbon nitride C Photoelectron spectroscopy B3 Solar cells Atomic layer etching 3 nm in size Thin films Buffer Couple PECVD CNTs’ collapse Vanadium Sesquioxide Atomic force microscopy Sputtering AZO thin films CaTiO3Pr^3^+ A Thin films Bixbyite Low-pressure plasma processing Anatase Avalanche breakdown B Chemical synthesis Oxides Carbon Nanotube CHLORINE PLASMAS Kirkendall effect Functionalization X-ray diffraction BOMBARDMENT V2O3 Biocapteurs Aryl-diazonium salts Non-volatile memory Alloying Biomasse XPS Scanning electron microscopy Chlorine Applications industrielles Thin film Spectroscopic ellipsometry NEXAFS CH4