Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

P. Chaudhuri; D. Das; P.P. Ray; Namita Dutta Gupta; Dhananjoy Roy; Christophe Longeaud

Journal Articles Journal of Non-Crystalline Solids Year : 2004

Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

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P. Chaudhuri

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D. Das

Function : Author

P.P. Ray

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Namita Dutta Gupta

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Laboratoire de génie électrique de Paris

Dhananjoy Roy

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Laboratoire de génie électrique de Paris

Christophe Longeaud

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PersonId : 6409
IdHAL : christophe-longeaud
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Laboratoire de génie électrique de Paris

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Submitted on : Friday, September 12, 2008-10:01:34 AM

Last modification on : Friday, March 24, 2023-2:52:50 PM

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hal-00321015 , version 1 (12-09-2008)

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P. Chaudhuri, D. Das, P.P. Ray, Namita Dutta Gupta, Dhananjoy Roy, et al.. Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution. Journal of Non-Crystalline Solids, 2004, 338-340, pp.236. ⟨hal-00321015⟩

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Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

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