Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

Namita Dutta Gupta; Christophe Longeaud; P. Chaudhuri; A. Bhaduri; S. Vignoli

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Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

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Namita Dutta Gupta

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Laboratoire de génie électrique de Paris

Christophe Longeaud

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PersonId : 6409
IdHAL : christophe-longeaud
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Laboratoire de génie électrique de Paris

P. Chaudhuri

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A. Bhaduri

Function : Author

S. Vignoli

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https://hal-centralesupelec.archives-ouvertes.fr/hal-00321707

Submitted on : Monday, September 15, 2008-4:52:59 PM

Last modification on : Tuesday, February 14, 2023-3:37:24 AM

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hal-00321707 , version 1 (15-09-2008)

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Namita Dutta Gupta, Christophe Longeaud, P. Chaudhuri, A. Bhaduri, S. Vignoli. Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures. 21st International Conference on Amorphous and Nanocrystalline Semiconductors, 2005, Portugal. ⟨hal-00321707⟩

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Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

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