Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures - CentraleSupélec Access content directly
Journal Articles Journal of Non-Crystalline Solids Year : 2006

Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

P. Chaudhuri
  • Function : Author
A. Bhaduri
  • Function : Author
S. Vignoli
  • Function : Author
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Dates and versions

hal-00321726 , version 1 (15-09-2008)

Identifiers

  • HAL Id : hal-00321726 , version 1

Cite

Namita Dutta Gupta, Christophe Longeaud, P. Chaudhuri, A. Bhaduri, S. Vignoli. Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures. Journal of Non-Crystalline Solids, 2006, 352, pp.1307-1309. ⟨hal-00321726⟩
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