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Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate

P. Leempoel
  • Function : Author
P. Descamps
  • Function : Author
T. Kervyn de Meerenedre
  • Function : Author
J. Charliac
Pere Roca I Cabarrocas
P. Bulkin
  • Function : Author
D. Daineka
  • Function : Author
T.H. Dao
  • Function : Author
Jean-Paul Kleider
Laboratoire de génie électrique de Paris
CV
Marie-Estelle Gueunier-Farret
Laboratoire de génie électrique de Paris
CV
Christophe Longeaud
Laboratoire de génie électrique de Paris

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https://hal-centralesupelec.archives-ouvertes.fr/hal-00322305

Submitted on : Wednesday, September 17, 2008-11:38:34 AM

Last modification on : Friday, March 24, 2023-2:52:51 PM

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hal-00322305 , version 1 (17-09-2008)

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  • HAL Id : hal-00322305 , version 1

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P. Leempoel, P. Descamps, T. Kervyn de Meerenedre, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. E-MRS 2007 Spring Meeting, 2007, France. ⟨hal-00322305⟩

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