Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD) - Archive ouverte HAL Access content directly
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Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD)

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Submitted on : Monday, January 12, 2009-11:52:03 AM

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hal-00351961 , version 1 (12-01-2009)

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  • HAL Id : hal-00351961 , version 1

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Jean-Claude Badot, A. Mantoux, Noël Baffier, Olivier Dubrunfaut, Daniel Lincot. Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD). 13th International Symposium on Intercalation Compounds (ISIC 13), Jun 2005, Clermont-Ferrand, France. ⟨hal-00351961⟩

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