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Conference Papers Year : 2009

Argon dilution as an alternative to hydrogen dilution for thin films deposition by rf-PECVD

Christophe Longeaud
Laboratoire de génie électrique de Paris
P. Chaudhuri
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Submitted on : Monday, January 11, 2010-5:00:59 PM

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hal-00446002 , version 1 (11-01-2010)

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Christophe Longeaud, P. Chaudhuri. Argon dilution as an alternative to hydrogen dilution for thin films deposition by rf-PECVD. 18th International photovoltaic science and engineering conference, 2009, Kolkata, India. pp.CD-Rom Proceedings. ⟨hal-00446002⟩

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