Growth and transport properties of HT-LixCoO2 thin films deposited by pulsed laser deposition

Efthymios Svoukis , G.I. Athanasopoulos , Alec Moradpour , Olivier Schneegans (1) , Alexandre Revcolevschi , John Giapintzakis

1 LGEP - Laboratoire de génie électrique de Paris

The successful in situ growth of single phase, c-axis oriented, layered structured LixCoO2 thin films on (0 0 0 1) Al2O3 substrates by pulsed laser deposition is reported. Thin films were grown in an oxygen pressure of 1 mbar and substrate temperatures varying from 300 up to 600 °C. It is found that the surface roughness and electrical resistance of the films depends strongly on the deposition temperatures.

Efthymios Svoukis, G.I. Athanasopoulos, Alec Moradpour, Olivier Schneegans, Alexandre Revcolevschi, et al.. Growth and transport properties of HT-LixCoO2 thin films deposited by pulsed laser deposition. Applied Surface Science, 2012, 258 (23), pp.9366-9369. ⟨10.1016/j.apsusc.2012.02.086⟩. ⟨hal-00777867⟩