Two-layer photo-thermal deflection model to study the non-radiative recombination process: Application to Ga0.7In0.3As0.23Sb0.77/GaSb and Al0.3Ga0.7As0.08Sb0.92/GaSb laser structures

Soufiene Ilahi (1) , Nourreddine Yacoubi (1) , Frédéric Genty (2)

1 Institut Préparatoire aux Etudes d'Ingénieurs de Nabeul - IPEIN
2 LMOPS - Laboratoire Matériaux Optiques, Photonique et Systèmes

Photo-thermal deflection technique is used to study the nonradiative recombination process in laser structures Ga0.7In0.3As0.23Sb0.77 and Al0.7Ga0.3As0.08Sb0.92 grown by molecular beam epitaxy on GaSb substrate. A two layer theoretical model has been developed, taking into account both thermal and electronic contributions in the photothermal signal; the coincidence between experimental curves giving the normalized amplitude and phase variations versus square root modulation frequency to the corresponding theoretical ones permits to determine non-radiative lifetime, electronic diffusivity, and surface and interface recombination velocities.

Soufiene Ilahi, Nourreddine Yacoubi, Frédéric Genty. Two-layer photo-thermal deflection model to study the non-radiative recombination process: Application to Ga0.7In0.3As0.23Sb0.77/GaSb and Al0.3Ga0.7As0.08Sb0.92/GaSb laser structures. Journal of Applied Physics, 2013, 113 (18), pp.183705. ⟨10.1063/1.4803513⟩. ⟨hal-00924736⟩