Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures - Archive ouverte HAL Access content directly
Conference Papers Year : 2013

Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures

R. Ruggeri
  • Function : Author
E.V. Johnson
Pavel Bulkin
P. Chapon
  • Function : Author
G. Mannino
  • Function : Author
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Dates and versions

hal-00931312 , version 1 (15-01-2014)

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  • HAL Id : hal-00931312 , version 1

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Sofia Gaiaschi, R. Ruggeri, E.V. Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, et al.. Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures. ICANS 25, Aug 2013, Toronto, Canada. ⟨hal-00931312⟩
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