Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS)

N. Puspitosari; S. Gaiaschi; C. Longeaud; M.E. Gueunier; E. V. Johnson

Poster communications

Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS)

N. Puspitosari ¹ S. Gaiaschi ¹ C. Longeaud ¹ M.E. Gueunier E. V. Johnson

1 GeePs - Laboratoire Génie électrique et électronique de Paris

Document type :

Poster communications

Domain :

Engineering Sciences [physics]

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https://hal-centralesupelec.archives-ouvertes.fr/hal-01245742
Contributor : Christophe Longeaud <>
Submitted on : Thursday, December 17, 2015 - 3:43:23 PM
Last modification on : Monday, November 23, 2020 - 3:38:14 PM

Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS)

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Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS)

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