Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS) - CentraleSupélec Access content directly
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Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS)

N. Puspitosari
  • Function : Author
Laboratoire Génie électrique et électronique de Paris
S. Gaiaschi
  • Function : Author
Laboratoire Génie électrique et électronique de Paris
C. Longeaud
Laboratoire Génie électrique et électronique de Paris
M.E. Gueunier
CV
E. V. Johnson
CV

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Engineering Sciences [physics]

christophe longeaud  : Connect in order to contact the contributor

https://hal-centralesupelec.archives-ouvertes.fr/hal-01245742

Submitted on : Thursday, December 17, 2015-3:43:23 PM

Last modification on : Friday, March 24, 2023-2:53:01 PM

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hal-01245742 , version 1 (17-12-2015)

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  • HAL Id : hal-01245742 , version 1

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N. Puspitosari, S. Gaiaschi, C. Longeaud, M.E. Gueunier, E. V. Johnson. Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS). Journées Nationales du Photovoltaïque 2015, Dec 2015, Dourdan, France. ⟨hal-01245742⟩

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UPMC CNRS CENTRALESUPELEC GEEPS PHEMADIC UNIV-PARIS-SACLAY SORBONNE-UNIVERSITE SU-SCIENCES GS-ENGINEERING GS-PHYSIQUE INSTITUT-SCIENCES-LUMIERE
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