Fast Fourier transform scanning spreading resistance microscopy: a novel technique to overcome the limitations of classical conductive AFM techniques

P Eyben; P Bisiaux; A Schulze; A Nazir; W Vandervorst

doi:10.1088/0957-4484/26/35/355702

Journal Articles Nanotechnology Year : 2015

Fast Fourier transform scanning spreading resistance microscopy: a novel technique to overcome the limitations of classical conductive AFM techniques

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P Eyben

Function : Author

P Bisiaux

Function : Author

Laboratoire Génie électrique et électronique de Paris

A Schulze

Function : Author

PAREXEL International [Berlin]

A Nazir

Function : Author

Directorate-General for Antiquities and Museums

W Vandervorst

Function : Author

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Physics [physics]

Thierry Leblanc : Connect in order to contact the contributor

https://hal-centralesupelec.archives-ouvertes.fr/hal-01310822

Submitted on : Tuesday, May 3, 2016-11:10:54 AM

Last modification on : Friday, March 24, 2023-2:53:02 PM

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hal-01310822 , version 1 (03-05-2016)

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HAL Id : hal-01310822 , version 1
DOI : 10.1088/0957-4484/26/35/355702

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P Eyben, P Bisiaux, A Schulze, A Nazir, W Vandervorst. Fast Fourier transform scanning spreading resistance microscopy: a novel technique to overcome the limitations of classical conductive AFM techniques. Nanotechnology, 2015, 26 (35), pp.355702. ⟨10.1088/0957-4484/26/35/355702⟩. ⟨hal-01310822⟩

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Fast Fourier transform scanning spreading resistance microscopy: a novel technique to overcome the limitations of classical conductive AFM techniques

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