Atomic layer deposition of gallium phosphide for silicon based photovoltaics - Archive ouverte HAL Access content directly
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hal-01363690 , version 1 (11-09-2016)

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  • HAL Id : hal-01363690 , version 1

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A.S. Gudovskikh, I.A. Morozov, D. A. Kudryashov, E.V. Nikitina, A. S. Bukatin, et al.. Atomic layer deposition of gallium phosphide for silicon based photovoltaics. Photovoltaic Technical Conference, PVTC 2016, May 2016, Marseille, France. ⟨hal-01363690⟩
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