Atomic layer deposition of gallium phosphide for silicon based photovoltaics

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https://hal-centralesupelec.archives-ouvertes.fr/hal-01363690
Contributor : Jean-Paul Kleider <>
Submitted on : Sunday, September 11, 2016 - 10:23:43 AM
Last modification on : Thursday, March 21, 2019 - 1:10:22 PM

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  • HAL Id : hal-01363690, version 1

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A.S. Gudovskikh, I.A. Morozov, D. A. Kudryashov, E.V. Nikitina, A. S. Bukatin, et al.. Atomic layer deposition of gallium phosphide for silicon based photovoltaics. Photovoltaic Technical Conference, PVTC 2016, May 2016, Marseille, France. 〈hal-01363690〉

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