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Low temperature plasma enhanced atomic layer deposition of GaP films on Si substrates

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https://hal-centralesupelec.archives-ouvertes.fr/hal-01632966
Contributor : Jean-Paul Kleider Connect in order to contact the contributor
Submitted on : Friday, November 10, 2017 - 6:17:03 PM
Last modification on : Thursday, September 9, 2021 - 3:02:43 AM

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  • HAL Id : hal-01632966, version 1

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Alexander S. Gudovskikh, D. A. Kudryashov, I.A. Morozov, Artem Baranov, A.V. Uvarov, et al.. Low temperature plasma enhanced atomic layer deposition of GaP films on Si substrates. ICANS27, The 27th International Conference on Amorphous and Nanocrystalline Semiconductors, Aug 2017, Seoul, South Korea. ⟨hal-01632966⟩

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