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Low temperature plasma enhanced atomic layer deposition of GaP films on Si substrates

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hal-01632966 , version 1 (10-11-2017)

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  • HAL Id : hal-01632966 , version 1

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Alexander S. Gudovskikh, D. A. Kudryashov, I.A. Morozov, Artem Baranov, A.V. Uvarov, et al.. Low temperature plasma enhanced atomic layer deposition of GaP films on Si substrates. ICANS27, The 27th International Conference on Amorphous and Nanocrystalline Semiconductors, Aug 2017, Seoul, South Korea. ⟨hal-01632966⟩
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