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Low temperature plasma enhanced atomic layer deposition of GaP films on Si substrates

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https://hal-centralesupelec.archives-ouvertes.fr/hal-01632966
Contributor : Jean-Paul Kleider <>
Submitted on : Friday, November 10, 2017 - 6:17:03 PM
Last modification on : Wednesday, September 16, 2020 - 5:51:00 PM

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  • HAL Id : hal-01632966, version 1

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Alexander S. Gudovskikh, D. A. Kudryashov, I.A. Morozov, Artem Baranov, A.V. Uvarov, et al.. Low temperature plasma enhanced atomic layer deposition of GaP films on Si substrates. ICANS27, The 27th International Conference on Amorphous and Nanocrystalline Semiconductors, Aug 2017, Seoul, South Korea. ⟨hal-01632966⟩

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