Recent progress on the amorphous silicon/crystalline silicon interface

Jean-Paul Kleider (1) , J Alvarez (1) , Rudolf Brüggemann (1) , Tristan Carrere (1, 2) , Marie-Estelle Gueunier-Farret (1) , Sylvain Le Gall (1) , Alexandra Levtchenko (1) , Delfina Muñoz (3) , David Reaux (1)

1 GeePs - Laboratoire Génie électrique et électronique de Paris
2 INES - Institut National de L'Energie Solaire
3 DTS - Département des Technologies Solaires

Keywords: Hydrogenated amorphous silicon; crystalline silicon; Interface properties

Domains: Physics [physics]; Condensed Matter [cond-mat]; Materials Science [cond-mat.mtrl-sci]; Engineering Sciences [physics]; Micro and nanotechnologies/Microelectronics; Engineering Sciences [physics]; Electric power; Engineering Sciences [physics]; Optics / Photonic; Engineering Sciences [physics]; Materials

Jean-Paul Kleider, J Alvarez, Rudolf Brüggemann, Tristan Carrere, Marie-Estelle Gueunier-Farret, et al.. Recent progress on the amorphous silicon/crystalline silicon interface. 20th ISCMP School and Conference, Sep 2018, Varna, Bulgaria. ⟨hal-01943423⟩