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Reliability of etching angle estimation of MEMS resonators from electrical measurements

Alexis Brenes 1 Bogdan Vysotskyi 2 Elie Lefeuvre 3 Jérôme Juillard 1 
1 GeePs - Laboratoire Génie électrique et électronique de Paris
2 C2N - Centre de Nanosciences et de Nanotechnologies [Marcoussis]
3 IEF - Institut d'électronique fondamentale
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https://hal-centralesupelec.archives-ouvertes.fr/hal-02907054
Contributor : Jérôme Juillard Connect in order to contact the contributor
Submitted on : Monday, July 27, 2020 - 9:41:22 AM
Last modification on : Saturday, June 25, 2022 - 10:49:56 PM

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CNRS | CENTRALESUPELEC | GEEPS | ECO2 | UNIV-PARIS-SACLAY | SORBONNE-UNIVERSITE | SU-SCIENCES | UP-SCIENCES | GS-ENGINEERING | INSTITUT-SCIENCES-LUMIERE

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Alexis Brenes, Bogdan Vysotskyi, Elie Lefeuvre, Jérôme Juillard. Reliability of etching angle estimation of MEMS resonators from electrical measurements. 2019 Symposium on Design, Test, Integration & Packaging of MEMS and MOEMS (DTIP), May 2019, Paris, France. pp.1-4, ⟨10.1109/DTIP.2019.8752716⟩. ⟨hal-02907054⟩

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