Amorphous Y-Ba-Cu-O oxygen-depleted thin films on silicon: wide frequency band dielectric characterizations help probing application to room temperature infrared detection - Archive ouverte HAL Access content directly
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Amorphous Y-Ba-Cu-O oxygen-depleted thin films on silicon: wide frequency band dielectric characterizations help probing application to room temperature infrared detection

Aurélie Gensbittel
Laboratoire de génie électrique de Paris
Jérôme de Lambert
  • Function : Author
Brice Leduc
  • Function : Author
Olivier Dubrunfaut
Laboratoire de génie électrique de Paris
CV
Alain Kreisler
Laboratoire de génie électrique de Paris
Annick Dégardin
  • Function : Author
Laboratoire de génie électrique de Paris

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https://hal-centralesupelec.archives-ouvertes.fr/hal-00780529

Submitted on : Thursday, January 24, 2013-11:12:47 AM

Last modification on : Friday, March 24, 2023-2:52:56 PM

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hal-00780529 , version 1 (24-01-2013)

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  • HAL Id : hal-00780529 , version 1

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Aurélie Gensbittel, Jérôme de Lambert, Brice Leduc, Olivier Dubrunfaut, Alain Kreisler, et al.. Amorphous Y-Ba-Cu-O oxygen-depleted thin films on silicon: wide frequency band dielectric characterizations help probing application to room temperature infrared detection. Conference of the European Materials Science Society (E-MRS 2012), May 2012, Strasbourg, France. ⟨hal-00780529⟩

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