The role of oxygen in magnetron sputtered Ta3N5 films for water photoelectrolysis

Martin Rudolph (1, 2) , D. Stanescu (3) , J Alvarez (4) , E. Foy (5, 6) , Jean-Paul Kleider (4) , Hélène Magnan (3) , Tiberiu Minea (1) , Nathalie Herlin-Boime (2) , B. Bouchet-Fabre (2) , Marie-Christine Hugon (1)

1 LPGP - Laboratoire de physique des gaz et des plasmas
2 LEDNA - Laboratoire Edifices Nanométriques
3 SPEC - UMR3680 - Service de physique de l'état condensé
4 GeePs - Laboratoire Génie électrique et électronique de Paris
5 LAPA - UMR 3685 - Laboratoire Archéomatériaux et Prévision de l'Altération
6 IRAMAT - LMC - IRAMAT - Laboratoire Métallurgies et Cultures

Domains: Physics [physics]; Condensed Matter [cond-mat]; Materials Science [cond-mat.mtrl-sci]; Engineering Sciences [physics]; Micro and nanotechnologies/Microelectronics; Engineering Sciences [physics]; Electric power; Engineering Sciences [physics]; Optics / Photonic; Engineering Sciences [physics]; Materials

Martin Rudolph, D. Stanescu, J Alvarez, E. Foy, Jean-Paul Kleider, et al.. The role of oxygen in magnetron sputtered Ta3N5 films for water photoelectrolysis. E-MRS 2016 Spring Meeting, May 2016, Lille, France. ⟨hal-01363717⟩