Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD) - CentraleSupélec Access content directly
Journal Articles Journal of Physics and Chemistry of Solids Year : 2006

Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD)

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thin films

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Material chemistry

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https://hal-centralesupelec.archives-ouvertes.fr/hal-00325014

Submitted on : Thursday, September 25, 2008-7:31:27 PM

Last modification on : Friday, June 2, 2023-3:14:43 PM

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hal-00325014 , version 1 (25-09-2008)

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  • HAL Id : hal-00325014 , version 1

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Jean-Claude Badot, A. Mantoux, Noël Baffier, Olivier Dubrunfaut, Daniel Lincot. Submicro- and nanostructural effects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD). Journal of Physics and Chemistry of Solids, 2006, 67, pp.1270-1274. ⟨hal-00325014⟩

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