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Journal Articles Journal of Materials Chemistry Year : 2004

Electrical properties of V2O5 thin films obtained by Atomic Layer Deposition (ALD)

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Submitted on : Monday, January 12, 2009-6:21:51 PM

Last modification on : Tuesday, February 14, 2023-3:38:04 AM

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hal-00352361 , version 1 (12-01-2009)

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  • HAL Id : hal-00352361 , version 1

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Jean-Claude Badot, A. Mantoux, Noël Baffier, Olivier Dubrunfaut, Daniel Lincot. Electrical properties of V2O5 thin films obtained by Atomic Layer Deposition (ALD). Journal of Materials Chemistry, 2004, 14, pp.3411-3415. ⟨hal-00352361⟩

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